Development and production of special photolithography, inspection and measurement equipment:
Photolithography, inspection and measurement equipment for the microelectronic industry:
For mask fabrication (masks for ICs, printed circuit boards, LCDs, TV shadow masks) :
single-channel, multi-channel and large-area laser pattern generators;
photo repeaters;
laser mask repair systems.
For photolithography:
steppers (wafer steppers, LCD steppers and PCB steppers) ;
mask aligners (contact / proximity exposure, top-to-bottom side alignment) ;
Inspection and measurement equipment:
flatness inspection systems for wafers, masks, LCDs;
defect inspection systems for wafers, masks, LCD masks;
critical dimensions inspection systems for wafers, masks;
coordinate measurement systems;
Laser Pattern Generators since 1983
Multi-Beam Laser Pattern Generator EM-5089 since 1984
