China Material Technology

Company Details

  • Business Type : Manufacturing
  • Location : Nanchang
  • Year Established : 2008
  • Number Of Employees : 26-50
  • Export Percentage : 80%
  • Production Lines : 7
  • R&D Staff : 21 - 30 people
  • Total Annual Revenue :
  • Main Markets : Americas,Africa,Asia,Caribbean,America,Europe,Middle East,Oceania,Worldwide
  • Main Products : Sputtering Target,Alloy,Pure Metal,Ceramic,Semiconductor Etc,
  • Country/Region : China
  • Links : China Minerals & Metallurgy, China Ceramics, China Non-Metallic Mineral Products,
  • Company Introduction

    China Material Technology Co., Ltd. (MAT-CN)  base on Chinese mainland, in the supply of sputtering targets and advance materials to industrial consumers and lab worldwide for many years in China. MAT-CN offers a wide range of specialist metals, alloys and inorganic chemical compounds. MAT-CN have lots of fabrication methods about material, and we will select the best ways to manufacture products base on raw materials speciafication. Some available methods show as below: Vacuum Induction Melting (VIM), Vacuum induced levitation melting furnace Vacuum Sintering, Vacuum Melting Casting, Vacuum Arc Melting, Hot Pressing (HP), Cold Isostatic Pressing(CIP), cold pressing and sinter, Vacuum sinter, FZ, CZ, CVD,vacuum forging ......

    Company Information

  • Contact Person : Yolanda
  • Telephone :
  • Mobilephone :
  • Fax Number :
  • Address : Gaoxin department Nanchang Jiangxi, Nanchang, Jiangxi, China,
  • Fax : 8679188165992
  • Website : Visit website
  • Company Product

    • Diameter 50.8mm Pd target99.99%-Palladium target-sputtering target(Mat-cn)
    • High density 99.99% purity of CeO2 target ----- sputtering target
    • High purity CaF2 target sputtering target ----- 99.99% CaF2 target
    • High purity sputtering target --- ATO 99.99% (Mat-cn)
    • High purity sputtering target --- MoS2 target Molybdenum Disulfide target (Mat-cn)
    • High purity sputtering target ---- Graphite crucible
    • High purity sputtering target for laboratory coating ------ LiF target
    • Low tolerance Titanium Dioxide target ------ sputtering target
    • Low tolerance ZnO target-High density Zniz oxide target-sputtering target
    • The finishing surfac- SiC target -sputtering target